Four dimensional map newly obtained invention patent authorization: "A method, system, medium and equipment for locating and processing map production anomalies"

According to data from the Tianyancha APP, Four Dimensional Map has been granted an invention patent titled "A Method, System, Medium, and Equipment for Anomalous Localization and Handling in Map Production". The patent application number is CN202310003808.4 and the authorization date is May 5, 2026. Patent Abstract: This application discloses a method, system, medium, and device for locating and processing map production anomalies, belonging to the field of map production technology. The method comprises: collecting log information during the map production process through a log collection module; Analyze the log information through the log analysis module and determine the corresponding first exception solution in the rule library based on the analysis results; If there is no first exception solution corresponding to the exception in the rule base, add the corresponding second exception solution based on the exception, establish the relationship between the second exception solution and the exception, and update the rule base; Handle anomalies in the map production process based on the first or second anomaly solution. By analyzing the log information during the map production process, accurate localization of anomalies in map production can be achieved, and corresponding solutions for anomalies can be found in the rule library based on the analysis results, achieving automatic processing of anomalies.